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Alloy based on the al-mg system for developing a target for magnetron thin films sputtering
https://doi.org/10.22349/1994-6716-2020-104-4-109-112
Abstract
The article presents research results on the development of a precision alloy of the Al-Mg-Ce-La-Y system for obtaining thin films by magnetron sputtering. Thin films are used to create electronic components on their basis.
About the Authors
R. Yu. Bystrov
NRC “Kurchatov Institute” — CRISM “Prometey”
Russian Federation
Russian Federation
49 Shpalernaya St, 191015 St Petersburg.
A. N. Belyakov
NRC “Kurchatov Institute” — CRISM “Prometey”
Russian Federation
Russian Federation
49 Shpalernaya St, 191015 St Petersburg.
A. F. Vasiliev
NRC “Kurchatov Institute” — CRISM “Prometey”
Russian Federation
Russian Federation
49 Shpalernaya St, 191015 St Petersburg.
I. S. Prudnikov
NRC “Kurchatov Institute” — CRISM “Prometey”
Russian Federation
Russian Federation
49 Shpalernaya St, 191015 St Petersburg.
B. V. Farmakovsky
NRC “Kurchatov Institute” — CRISM “Prometey”
Russian Federation
Russian Federation
Cand. Sc. (Eng).
49 Shpalernaya St, 191015 St Petersburg.
References
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Review
For citations:
Bystrov R.Yu., Belyakov A.N., Vasiliev A.F., Prudnikov I.S., Farmakovsky B.V. Alloy based on the al-mg system for developing a target for magnetron thin films sputtering. Voprosy Materialovedeniya. 2020;(4(104)):109-112. (In Russ.) https://doi.org/10.22349/1994-6716-2020-104-4-109-112
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